A Reuters report says a Chinese prototype extreme ultraviolet lithography machine built by former ASML engineers is now undergoing testing in Shenzhen after Reuters revealed the project used ex-ASML staff working under fake names and salvaged parts.The prototype can reportedly generate EUV light but is not yet producing chips, and China aims for domestic EUV-based production by 2028 though some experts say 2030 is more likely as a Chinese chip startup's shares jumped 693 percent and Xi Jinping presses for semiconductor self-sufficiency.